Highly scalable synthesis of mos2 thin films with precise. Arnell centre for advanced materials and surface engineering, university of salford, salford m5 4wt, uk received 20 september 1999 abstract magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important. Some of them may be listed as dual magnetron sputtering ms, 12,16 12. A systematic study has been made of the influence of oxygen concentration and the rf power. Substrate temperature effects on dc sputtered mo thin film. Reactive magnetron sputter deposition of superconducting. Thickness effect on properties of titanium film deposited by d. E manikandan ithemba labs national research foundation, 1 old faure road, somerset west, po box. Fundamentals of high power impulse magnetron sputtering. Annealinginduced changes in electrical characteristics of. Disorderfree sputtering method on graphene xue peng qiu, 1young jun shin, jing niu,1 narayanapillai kulothungasagaran,1 gopinadhan kalon,1,2 caiyu qiu,3 ting yu,2,3 and hyunsoo yang1,2,a 1department of electrical and computer engineering, national university of singapore, 117576, singapore. The optical bandgap of blft films increased gradually from 2.
Effects of an additional magnetic field in ito thin film deposition by magnetron sputtering. Pdf sustainability issues in sputtering deposition technology. Hall mobility of cuprous oxide thin films deposited by. Pdf hydroxyapatite ha is a material with outstanding biocompatibility. In this way, rf magnetron sputtering allows for higher current at lower gas pressure that achieves an even higher deposition rate. In this study, rf magnetron sputtering was applied for ha coating. Pdf rf magnetron sputtering coating of hydroxyapatite on alkali. Crystallization and characterization of gesn deposited on. Thermochromic vo2 thin films synthesized by rfinverted cylindrical magnetron sputtering.
Volume 41, issue 1, part a, january 2015, pages 617621. Recent progress in magnetron sputtering technology used. All layers are deposited by magnetron sputtering with a base pressure of national research foundation of korea nrf. The role of the zn buffer layers in the structural and photoluminescence properties of zno films on zn buffer layers deposited by rf magnetron sputtering article in vacuum 8212. Combinatorial plasma sputtering of pt x pd y thin film. Interfacial control on microstructure, morphology and.
D color changes by the thickness increase of the precursor complex films and the mos. Dr linda prinsloo and dr jack nel, university of pretoria, for sharing me with your. Kang, zhong lin wang, and keon jae lee, department of materials science and engineering, korea advanced institute of science and technology kaist, 3731 gwahangno, yuseonggu, daejeon 305701 republic of korea, and school of materials. Afm results reveal that the surface roughness of mos 2 increases with. Sputtering introduces structural disorder in ag films while doping introduces extra disorder and. Nano express open access physical properties of metaldoped zinc oxide films for surface acoustic wave application sanghun nam, sangjin cho and jinhyo boo abstract metaldoped zno mzo thin films show changes of the following properties by a dopant. Effects of the o2ar gas flow ratio on the electrical and.
Nrf funded by the ministry of science, ict nrf 2017m1a2a2086648. Lcotio 2 electrodes as cathodes for lithiumion batteries libs were fabricated using a radiofrequency rf magnetron sputtering deposition method on al foil hohsen corporation as a substrate using licoo 2. Chen, yang liu, zhan hong cen, shu zhu, ming yang, student member, ieee, jen it wong, graduate student member, ieee, yi bin li, and sam zhang abstractalrich al 2o 3 thin. Effects of an additional magnetic field in ito thin film. A stainlesssteel chamber was evacuated with turbomolecular pump and a mechanical pump. By virtue of electron probe microanalysis epma, xray diffraction pattern xrd, scanning electron microscope sem, atomic force microscope afm and nano indentation test.
World academy of science twas in collaboration with national research foundation nrf. Agi nanostructures with different shapesthat could lead to miniaturized nanoscale optoelectronic devices 10. Tantalum nitride tan x thin films were grown utilizing an inductively coupled plasma icp assisted direct current dc sputtering, and 20100% improved microhardness values were obtained. K of niobium titanium nitride nbtin thin films allows for lowloss circuits up to 1. We are specifically concerned here with cathodic sputtering techniques where the ions are derived from a plasma in a lowpressure gas between. Molybdenum nitride mon x thin films were deposited on ptype si1 0 0 wafer using reactive radio frequency magnetron sputtering at various nitrogen gas ratios in an ultra high vacuum uhv system. Annealinginduced changes in electrical characteristics of alalrich al 2o 3psi diodes zhen liu, t. A combinatorial sputtering system, based on magnetron enhanced plasma sputtering, was employed in the syntheses of pt x pd y thin film catalysts, and a multichannel potentiostat allowed for highthroughput parallel screening of the deposited electrocatalysts towards the electrooxidation of aqueous sulphur dioxide so 2. Piezoelectric batio3 thin film nanogenerator on plastic.
Surface characteristics of mon x thin films obtained by. Cuprous oxide cu2o is a promising earthabundant semiconductor for photovoltaic applications. Characterisation and optimisation of indium tin oxide. Properties of rf magnetron sputtered zinc oxide thin films. This was supported by national research foundation of korea nrf funded by the ministry of science and ict msit nrf 2017r1a2b4006071. For plasmabased deposition techniques, high ionization through highdensity plasma plays an important role in improving the deposited film. Among these, radio frequency rf magnetron sputtering, a relatively costeffective deposition technique compared with those listed above, has sufficient control over the stoichiometry and uniformity of the film employed to produce zns thin films 1214. Lesker company home vacuum science is our business. Fabrication and evaluation of transparent conducting oxide. High power impulse magnetron sputtering hipims is a relatively newly developed technique, which relies on the creation of a dense plasma in front of the sputtering target to produce a large fraction of ions of the sputtered material.
Rf power of 300 w, dc power of v, ar flow rate of 10 sccm, working pressure of 0. Al thin films for transparent conductors were deposited on sapphire 0001 substrates by using an rf magnetron sputtering technique. In this work, rf magnetron sputtering is exploited as an innovative technique to fabricate. Nrf, funded by the ministry of education, science and. The detailed microstructural changes of the tan x films were characterized utilizing transmission electron microscopy tem, as a function of nitrogen gas fraction and icp power. The challenge in mo deposition by magnetron sputtering lies in simultaneously achieving good adhesion to the substrates while retaining the electrical and optical properties. To investigate the structure and the surface morphology of mos 2 films, atomic force microscopy afm, raman spectroscopy, and scanning electron microscopy sem were carried out. Approach for the optimization of characteristic properties. Acknowledgments this work was supported by the national research foundation of korea nrf funded by the korean. Multifunctional reactivelysputtered copper oxide electrodes for supercapacitor and electrocatalyst in direct methanol fuel cell applications skip to.
The films were deposited with a dc sputtering power of 70 w power density. In figure 2, it can be found that the commonly used target materials on magnetron sputtering coated fabrics were metals, metal oxides, polymer. Deac0205ch11231 and the nrf and the moe, singapore. Effects of the o2ar flow ratio in the sputtering process. Lowbandgap, highly caxisoriented aldoped zno thin films long wen, manish kumar, hyung jun cho et al. Bilayer mo films, comprising five different thickness ratios of a high pressure hp deposited bottom. Preparation of mos nanopetals by rf magnetron sputtering. The deposition behavior was compared between floating and grounded substrates at room temperature. Greene 2 1 ghent university, department of solid state sciences, krijgslaan 281 s1, 9000 ghent, belgium 2 materials science and physics departments and the frederick seitz materials research laboratory, university of illinois, urbana, illinois 61801, usa sputter deposition is a widely used technique to deposit thin films on substrates. Physical vapour deposition pvd techniques such as magnetron sputtering, filtered cathodic arc, ionplating. Abstractthe superconducting critical temperature tc 15. We demonstrate the preparation of molybdenum disulfide mos 2 nanopetals by rf magnetron sputtering and electronbeam irradiation ebi.
To this end, reactive magnetron sputtering offers a simple, onestep, and relatively costeffective technique that can be used for largescale applications. Coatings free fulltext transparent amorphous oxide. Two metallic phases, mo1 1 0 and mo2 1 1, were detected from the film obtained without nitrogen gas in the sputter gas. Pdf sputtering involves ejection of atoms from a surface upon impingement by energetic ions. Piezoelectric batio 3 thin film nanogenerator on plastic substrates kwiil park, sheng xu, ying liu, geontae hwang, sukjoong l. Microstructural evolution of tantalum nitride thin films.
For example, in magnetron sputtering, the deposition parameters such as substrate. The phosphor films grown at different deposition temperatures showed different microstructural and optical properties. The influence of substrate temperature on the structural and optical properties of zns films prepared in the experiment has been characterized. The catenary is the curve that a freehanging chain assumes under its own weight, and thought to be a true mathematical and mechanical form in architecture by robert hooke in the 1670s, with nevertheless no significant phenomena observed in optics. Started appearing for both dc and rf sputtered films. Universal response curve for nanowire superconducting. Vanadium dioxide thin films were deposited on glass substrate, at various temperatures between 350 to 600 0c, deposition time kept constant at 1 hour.
Magnetron sputtering is the process of choice for the deposition of wide range of important coatings for wear resistance, corrosion resistance, decorative, and coating with specific optical and electrical properties. The leading global provider of highquality vacuum products and systems, along with an established tradition of service and attention to detail, the kurt j. Zinc sulfide zns thin films were deposited on glass substrates using radio frequency magnetron sputtering. Photoluminescence properties of eudoped canb2o6 thin. Crystalline structure and optoelectrical properties of silverdoped tin monoxide thin films with different dopant concentrations prepared by dc magnetron sputtering are investigated. Schematic diagram showing the setup of magnetron sputtering deposition. Characterisation and optimisation of indium tin oxide films deposited by pulsed dc magnetron sputtering for heterojunction silicon wafer solar. Magnetron sputtering achieves a higher plasma density compared to.
Characterization of agdoped ptype sno thin films prepared by dc magnetron sputtering hoaiphuongpham,1 thanhgianglethuy,1 quangtrungtran,1 hoanghungnguyen,1 huynhtranmyhoa,1 hoangthithu,1 andtranvietcuong1,2. The effect of sputter cathode design on deposition parameters. It can achieve high deposition rates, uniform deposition over largearea substrates, and allows for easy control over the composition, oxidation states and phases of the deposited materials. The xray diffraction patterns reveal that the tetragonal sno phase exhibits preferred orientations along 101 and 110 planes. Magnetron sputtering an overview sciencedirect topics. Structural and optical properties of fe doped bismuth. Images in plasma science scheduled for publication in august 2014. Program through the national research foundation of korea nrf. Over the past year a total of 64 postgraduate students used the. We used these two techniques in order to comparatively study the effect of deposition temperature on vo2 thin films microstructure, electrical and optical properties. Factors affecting the properties of highly conductive. The role of the zn buffer layers in the structural and. Nrf dst, ithemba labs, university of the western cape and the research committee of the university of zululand for your financial support during this investigation. Theactive partofthedetectoristhenarrowbridgeinthecentreofthe image.
Summary recent advances in the classic magnetron sputter cathode design have enabled higher quality thin films and improved deposition. In hipims, high power pulses with a length of 100 s are applied to a conventional planar magnetron. Thickness dependent chemical and microstructural properties of dc. Molybdenum mo thin films are widely used as rear electrodes in copper indium gallium diselenide cigs solar cells.
With rf magnetron sputtering the magnetic field forms a boundary tunnel which traps electrons near the surface of the target improving the efficiency of gas ion formation and constraining the discharge of the plasma. Sputter deposition, kjl cms18 multisource university of florida. We show that the optical catenary can serve as a unique building block of metasurfaces to produce continuous and linear phase shift. Adhesion improvement and characterization of magnetron. Zno thin films were deposited on silicon substrate by rf magnetron sputtering using metallic zinc target. Employing onset potential as the screening criterion, it was found that. Various deposition methods such as highpower impulse magnetron sputtering and ionbeam sputtering have been developed for physical vapor deposition technology and are still being studied. Catenary optics for achromatic generation of perfect. Structural and ion beam analysis of reactive magnetron. Mo magnetron sputtering, bilayer, electrical properties, backcontact layer, cigs solar cells.
Structural and optical properties of zns thin films. Magnetron sputtering is a magnetically enhanced sputtering technique discovered by penning and subsequently developed. The structural and optical properties of zns thin films were characterized with xray diffraction xrd, field emission scanning electron microscopy fesem, energy dispersive analysis of xrays and uvvisible. B,c digital image and threedimensional afm image of the assynthesized mos 2 thin film on a 6in. Nano express open access physical properties of metal. National research foundation of korea nrf 2012h1b8a2026256. Rf sputtering technique and conditions for depositing mgin2o4 films. Laboratories, the uvvisnir system, femtosecond laser and the rc magnetron sputtering system have been replaced. Program nrf20110024709 through the national research. The objective of this work is to study the structure and chemical properties of different thicknesses of titanium nitride thin. This study was supported by basic science research program through the national research foundation. And the adoptability of these films for the application in flexible oleds was successfully confirmed through the flexibility evaluation by cyclic bending test and the performance evaluation with oled device.
You may request that your target be loaded into the same sputter gun in the future for consistency. First of all suitable layer systems are identified for specific applications. Magnetron sputtering is a highrate vacuum coating technique that allows the deposition of many types of materials, including metals and ceramics, onto as many types of substrate materials by the use of a specially formed magnetic field applied to a diode sputtering target. We report hall mobilities of polycrystalline cu2o thin films deposited by reactive dc magnetron sputt. After deposition of mos2, ebi process, the equipment for which was housed in the same chamber as rf magnetron sputtering system, was conducted. For a simple planar magnetic system, a planar cathode is backed by permanent magnets that provide a toroidal field.
1204 1360 1169 1202 831 36 782 1382 415 169 1216 274 323 578 34 1288 608 1507 947 490 1374 1242 513 493 1462 89 579 395 944 1375 605 1317 1090